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This Test Method is intended primarily for use with wafers that meet the dimension and tolerance requirements of SEMI M1
ROA（Roll-Off Amount）法は半導体デバイス工程で使われるウェーハのエッジ近傍形状を定量化するのに適している。
SEMI T8-1110 (technical revision)
Originally published June 1997
This standard falls under the general specification
E14600 - SEMI E146 - Test Method for the Determination of Particulate Contamination from Minienvironments used for Storage and Transport of Silicon Wafers Revision:SEMI E146-0306 - Inactive This Test Method is intendedNOTICE: This Standard or Safety Guideline has an Inactive Status because the conditions to maintain Current Status have not been met. Inactive Standards or Safety Guidelines are available from SEMI and continue to be valid for use. This Standard defines a test method for the determination of particulate contamination from minienvironments used for storage and transport of silicon wafers in semiconductor manufacturing. The particulate contamination
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