M05700 - SEMI M57 - シリコンアニールウェーハの仕様 Revision:SEMI M57-1011 - Superseded When utilities implement measures to

When utilities implement measures to increase power system reliability

§ 10 and Appendix 2 provide methods to determine reliability growth and degradation

SEMI E126-0708 (Reapproved 0518)

Specifies measurement methods for visual appearance (dot defects

This Test Method is reproducible and provides a metric (CPT) in addition to a qualitative (visual) evaluation of corrosion resistance

M05700 - SEMI M57 - シリコンアニールウェーハの仕様 Revision:SEMI M57-1011 - Superseded When utilities implement measures toglobal Silicon Wafer Committee201323global Audits and Reviews Subcommittee20134www. semiviews. org www. semi. org20047201110 180 nm130 nm90 nm( R1 1), 65 nm, 45 nm, 32 nm, ( R1 2), 22 nm ( R1 3) crystal originated particlesCOPdenuded zoneDZ Referenced SEMI Standards SEMI M1 Specifications for Polished Single Crystal Silicon Wafers SEMI M35 Guide for Developing Specifications for Silicon Wafer Surface Features Detected by Automated Inspection SEMI M45