E04100 - SEMI E41 - Exception Management (EM) Standard StdPbc-0326 As gate dielectric thickness approaches

As gate dielectric thickness approaches 1 nm

In this Standard

and research and development

This Specification defines a common approach for gathering and combining data to support the reduction of cycle time through the identification and elimination of product time waste in the factory life cycle of a product unit

SEMI E128-0414 (Reapproved 0224)

E04100 - SEMI E41 - Exception Management (EM) Standard StdPbc-0326 As gate dielectric thickness approachesInteractive exception handling enhances the error recovery ability while maintaining automated control in the factory. This standard addresses the communications needs within the semiconductor manufacturing environment with respect to equipment exception handling. This standard specifies capabilities to be provided by the exception agent for effective reporting and interaction with respect to abnormal situations in the equipment. It describes the